1. Requirements for dust-free workshop for semiconductor, chip and integrated circuit production
The state strongly supports the development of semiconductors, and the purification of semiconductor materials is an important basis for the development of semiconductor devices. Due to the process requirements of large-scale and very large-scale integrated circuits, in order to obtain high-purity silicon materials, the high purity of raw materials and intermediate media and the cleanliness of production environment have become a prominent problem affecting product quality.
Today, China has become the largest semiconductor market in the world. Driven by strong demand and strong policies, the chip industry is ushering in the third industrial transfer, and the trend of transfer to the mainland is irresistible. The yield of integrated circuit chip is related to the defect density of the chip, and the defect density of the chip is related to the number of particles in the air. Therefore, the rapid development of integrated circuits not only has high requirements for controlling the size of particles in the air, but also needs to further control the number of particles; At the same time, there are also relevant requirements for the chemical pollution control of VLSI production environment.
2. Requirements for the production of precision machinery and fine chemical products
With the development of science and technology, the production and processing of many industrial products put forward high requirements for the dust concentration in the production environment, which requires a certain air cleanliness level in the production environment and the supply quality of various related substances required for controlling the production process. For example, in film production, if the film is polluted by dust, emulsion oxidation, activity weakening and pH value change will occur, which will affect the photosensitive performance of the film.
3. Requirements for dust-free workshops for the production of pharmaceutical products
Medicine is a special commodity used to prevent and treat diseases and restore and adjust body functions. Its quality is directly related to people's health and safety. If some drugs are polluted or cross polluted by microorganisms, dust particles, etc. in the manufacturing process, unexpected diseases and hazards may occur.
4. Requirements for dust-free workshop in medical application and medical research
Industrial clean technology and industrial dust-free workshop are mostly used in industrial environmental control represented by integrated circuits; In medicine, biological dust-free workshops are often used for microbial pollution control. In the biological dust-free workshop, these microorganisms are mostly composed of bacteria and fungi, with particle size of more than 0.2um. The particle size of common bacteria is more than 0.5um, and most of them are attached to other material particles. Biological pollution channels are not only through the air, but also related to the human body and the clothing of operators.
In the field of medical research, biological laboratories, aseptic laboratories and "special feeding animals" feeding rooms for biochemical and medical experiments also need to control microbial pollution.
5. Dust free workshop requirements for cosmetics and food production
Most modern cosmetics contain proteins, vitamins, amino acids, plant extracts, etc. these components provide favorable conditions for the breeding and reproduction of microorganisms such as bacteria and molds. Therefore, microbial pollution is an important factor affecting the quality of cosmetics. The control objects of the dust-free workshop used in the production of cosmetics are mainly dust particles and microorganisms, which is similar to the requirements of the dust-free workshop used in drug production. At present, the air cleanliness level of the dust-free workshop for cosmetics production can be carried out with reference to the GMP specification of drugs.